Digitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applications

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dc.authoridBolat, Sami/0000-0001-7656-0061
dc.contributor.authorTilkioglu, Bilge T.
dc.contributor.authorBolat, Sami
dc.contributor.authorTanrikulu, Mahmud Yusuf
dc.contributor.authorOkyay, Ali Kemal
dc.date.accessioned2025-01-06T17:45:09Z
dc.date.available2025-01-06T17:45:09Z
dc.date.issued2017
dc.description.abstractThe authors demonstrate the digital alloying of ZnO and TiO2 via atomic layer deposition method to be utilized as the active material of uncooled microbolometers. Depositions are carried out at 200 degrees C. Crystallinity of the material is shown to be degraded with the increase of the Ti content in the grown film. A maximum temperature coefficient of resistance (TCR) of 5.96%/K is obtained with the films containing 12.2 at. % Ti, and the obtained TCR value is shown to be temperature insensitive in the 15-22 degrees C, thereby allowing a wide range of operation temperatures for the low cost microbolometers. (C) 2017 American Vacuum Society.
dc.description.sponsorshipScientific and Technological Research Council of Turkey (TUBITAK) [112M004, 112E052, 113M815]; European Union FP7 Marie Curie International Reintegration Grant (PIOS) [PIRG04-GA-2008-239444]; Turkish Academy of Sciences Distinguished Young Scientist Award (TUBA GEBIP); BAGEP; FABED; TUBITAK-BIDEB
dc.description.sponsorshipThis work was partially supported in part by the Scientific and Technological Research Council of Turkey (TUBITAK), Grant Nos. 112M004, 112E052, and 113M815. A.K.O. acknowledges the partial support from European Union FP7 Marie Curie International Reintegration Grant (PIOS, Grant No. PIRG04-GA-2008-239444), and the partial support from the Turkish Academy of Sciences Distinguished Young Scientist Award (TUBA GEBIP), BAGEP, and FABED. S.B. thanks TUBITAK-BIDEB for Ph.D. scholarship.
dc.identifier.doi10.1116/1.4976513
dc.identifier.issn0734-2101
dc.identifier.issn1520-8559
dc.identifier.issue2
dc.identifier.scopus2-s2.0-85013074482
dc.identifier.scopusqualityQ2
dc.identifier.urihttps://doi.org/10.1116/1.4976513
dc.identifier.urihttps://hdl.handle.net/20.500.14669/3331
dc.identifier.volume35
dc.identifier.wosWOS:000397762400039
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherA V S Amer Inst Physics
dc.relation.ispartofJournal of Vacuum Science & Technology A
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_20241211
dc.subjectTransıtıon
dc.subjectOxıdatıon
dc.subjectCatalysts
dc.titleDigitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applications
dc.typeArticle

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