Digitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applications

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Tarih

2017

Dergi Başlığı

Dergi ISSN

Cilt Başlığı

Yayıncı

A V S Amer Inst Physics

Erişim Hakkı

info:eu-repo/semantics/closedAccess

Özet

The authors demonstrate the digital alloying of ZnO and TiO2 via atomic layer deposition method to be utilized as the active material of uncooled microbolometers. Depositions are carried out at 200 degrees C. Crystallinity of the material is shown to be degraded with the increase of the Ti content in the grown film. A maximum temperature coefficient of resistance (TCR) of 5.96%/K is obtained with the films containing 12.2 at. % Ti, and the obtained TCR value is shown to be temperature insensitive in the 15-22 degrees C, thereby allowing a wide range of operation temperatures for the low cost microbolometers. (C) 2017 American Vacuum Society.

Açıklama

Anahtar Kelimeler

Transıtıon, Oxıdatıon, Catalysts

Kaynak

Journal of Vacuum Science & Technology A

WoS Q Değeri

Q3

Scopus Q Değeri

Q2

Cilt

35

Sayı

2

Künye