Digitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applications
[ X ]
Tarih
2017
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
A V S Amer Inst Physics
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
The authors demonstrate the digital alloying of ZnO and TiO2 via atomic layer deposition method to be utilized as the active material of uncooled microbolometers. Depositions are carried out at 200 degrees C. Crystallinity of the material is shown to be degraded with the increase of the Ti content in the grown film. A maximum temperature coefficient of resistance (TCR) of 5.96%/K is obtained with the films containing 12.2 at. % Ti, and the obtained TCR value is shown to be temperature insensitive in the 15-22 degrees C, thereby allowing a wide range of operation temperatures for the low cost microbolometers. (C) 2017 American Vacuum Society.
Açıklama
Anahtar Kelimeler
Transıtıon, Oxıdatıon, Catalysts
Kaynak
Journal of Vacuum Science & Technology A
WoS Q Değeri
Q3
Scopus Q Değeri
Q2
Cilt
35
Sayı
2