Atomic layer deposition synthesized TiOx thin films and their application as microbolometer active materials

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dc.authoridTANRIKULU, M. Yusuf/0000-0001-7956-1289
dc.authoridTopalli, Kagan/0000-0002-4020-5751
dc.contributor.authorTanrikulu, Mahmud Yusuf
dc.contributor.authorRasouli, Hamid Reza
dc.contributor.authorGhaffari, Mohammad
dc.contributor.authorTopalli, Kagan
dc.contributor.authorOkyay, Ali Kemal
dc.date.accessioned2025-01-06T17:44:52Z
dc.date.available2025-01-06T17:44:52Z
dc.date.issued2016
dc.description.abstractThis paper demonstrates the possible usage of TiOx thin films synthesized by atomic layer deposition as a microbolometer active material. Thin film electrical resistance is investigated as a function of thermal annealing. It is found that the temperature coefficient of resistance values can be controlled by coating/annealing processes, and the value as high as -9%/K near room temperature is obtained. The noise properties of TiOx films are characterized. It is shown that TiOx films grown by atomic layer deposition technique could have a significant potential to be used as a new active material for microbolometer-based applications. (C) 2016 American Vacuum Society.
dc.description.sponsorshipScientific and Technological Research Council of Turkey (TUBITAK) [113M912]; Adana Science and Technology University [MUHDBF.EEM.2014-10]; TUBA
dc.description.sponsorshipThis work was supported by the Scientific and Technological Research Council of Turkey (TUBITAK), Grant No. 113M912 and Adana Science and Technology University with Grant No. MUHDBF.EEM.2014-10. Ali Kemal Okyay is thankful to TUBA for GEBIP Award.
dc.identifier.doi10.1116/1.4947120
dc.identifier.issn0734-2101
dc.identifier.issn1520-8559
dc.identifier.issue3
dc.identifier.scopus2-s2.0-84966711098
dc.identifier.scopusqualityQ2
dc.identifier.urihttps://doi.org/10.1116/1.4947120
dc.identifier.urihttps://hdl.handle.net/20.500.14669/3220
dc.identifier.volume34
dc.identifier.wosWOS:000379792200026
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherA V S Amer Inst Physics
dc.relation.ispartofJournal of Vacuum Science & Technology A
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_20241211
dc.subjectAnatase
dc.subjectOxıde
dc.subjectXps
dc.titleAtomic layer deposition synthesized TiOx thin films and their application as microbolometer active materials
dc.typeArticle

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