Investigation of Magnetic Anisotropy in the Ni-Ge and Ni(NiO)-Ge Thin Films

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dc.authoridEkicibil, Ahmet/0000-0003-3071-0444
dc.authoridKaradag, Faruk/0000-0001-7862-9085
dc.contributor.authorKaya, Dogan
dc.contributor.authorAkyol, Mustafa
dc.contributor.authorWang, Yitao
dc.contributor.authorGuo, Quanmin
dc.contributor.authorKaradag, Faruk
dc.contributor.authorEkicibil, Ahmet
dc.date.accessioned2025-01-06T17:43:47Z
dc.date.available2025-01-06T17:43:47Z
dc.date.issued2021
dc.description.abstractWe studied the structural and magnetic properties of Ni-Ge and Ni(NiO)-Ge films deposited by physical vapor deposition technique on the Si/SiO2 substrate. The x-ray diffraction (XRD) analysis show that as-prepared samples exhibit clear peaks of Ge, Ni, and Au with a cubic symmetry belongs to space group Fm (3) over barm. Due to the thermal annealing process at 350 degrees C, NiO layer formed on Ni layer. The NiO formation has reduced the interaction of Ni-Ge interlayer which is confirmed by XRD data. Investigation of temperature-dependent magnetic moment revealed the Neel and the critical temperatures as 93 and 294 K, respectively. The hysteresis loops showed that the preferred magnetization direction for samples at 300 K is the in-plane (parallel) which reaches saturation easier than out-of-plane (perpendicular) loops. The formation of NiGe interlayer resulted in a magnetically dead-region which led to decrease ferromagnetic domain and the coercive field. (C) 2020 Elsevier B.V. All rights reserved.
dc.description.sponsorshipCukurova University [FBA-2018-10813]
dc.description.sponsorshipThe authors are thankful for the financial support of Cukurova University Scientific Research Funding Grand No: FBA-2018-10813.
dc.identifier.doi10.1016/j.molstruc.2020.129662
dc.identifier.issn0022-2860
dc.identifier.issn1872-8014
dc.identifier.scopus2-s2.0-85097105937
dc.identifier.scopusqualityQ1
dc.identifier.urihttps://doi.org/10.1016/j.molstruc.2020.129662
dc.identifier.urihttps://hdl.handle.net/20.500.14669/2799
dc.identifier.volume1230
dc.identifier.wosWOS:000630326000027
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherElsevier
dc.relation.ispartofJournal of Molecular Structure
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_20241211
dc.subjectNiGe thin fims
dc.subjectStructural properties
dc.subjectMagnetic anisotropy
dc.subjectXRD
dc.subjectSEM
dc.subjectPPMS
dc.titleInvestigation of Magnetic Anisotropy in the Ni-Ge and Ni(NiO)-Ge Thin Films
dc.typeArticle

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