The evolution of nanoscale pores with post-annealing and the structure-electrical property correlation in vanadium oxide thin films

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dc.authoridOKSUZOGLU, RAMIS MUSTAFA/0000-0002-0574-5170
dc.contributor.authorDirican, Emrah
dc.contributor.authorYagci, Ahmet Murat
dc.contributor.authorTanrikulu, Mahmud Yusuf
dc.contributor.authorOkszoglu, Ramis Mustafa
dc.date.accessioned2025-01-06T17:44:48Z
dc.date.available2025-01-06T17:44:48Z
dc.date.issued2022
dc.description.abstractStructure-property correlation in vanadium oxide nanoscale thin films used in uncooled thermal detectors is a crucial question for device performance. The purpose of this work is to investigate the evolution of the nanoscale pores with post-annealing temperature and its correlation to electrical properties. It is observed that the as-deposited film has an amorphous matrix containing nanoscale crystal grains of VO2, V2O5, and V6O13 phases, and additionally nanoscale fibrous-like pores. The film post-annealed at 200 C under high purity N-2 atmosphere for 3 h possesses nanoscale crystal grains predominantly with the VO2 phase besides V6O13 and nanoscale spherical pores. After post-annealing at 300 ?, a clear enhancement in crystallinity and diminishing of amorphous structure has been found, and the film contains VO2, V2O3, and V(6)O(13 )phases, additionally larger pores and cracks. The electrical resistance and temperature coefficient of resistance increase with increasing temperature, whereas the electrical noise reduces after annealing at 200 ?& nbsp;and increases again at 300 ?. The best combination of values for 1/f noise corner frequency (5.7 kHz), electrical resistance (90 k omega), and temperature coefficient of resistance (-2.71 %K- 1) is obtained for the film after post-annealing at 200 ?, favorable for application.
dc.description.sponsorshipScientific and Technological Research Council of Turkey (TUBITAK) [MAG-213M494]
dc.description.sponsorshipAcknowledgements This work is supported by the Scientific and Technological Research Council of Turkey (TUBITAK, Project No: MAG-213M494) .
dc.identifier.doi10.1016/j.tsf.2021.139078
dc.identifier.issn0040-6090
dc.identifier.issn1879-2731
dc.identifier.scopus2-s2.0-85122639196
dc.identifier.scopusqualityQ2
dc.identifier.urihttps://doi.org/10.1016/j.tsf.2021.139078
dc.identifier.urihttps://hdl.handle.net/20.500.14669/3167
dc.identifier.volume744
dc.identifier.wosWOS:000783631600001
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherElsevier Science Sa
dc.relation.ispartofThin Solid Films
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_20241211
dc.subjectVanadium oxide
dc.subjectThin film
dc.subjectElectrical properties
dc.subjectStructural properties
dc.subjectNanoscale pores
dc.subjectPost-annealing
dc.subjectSputtering
dc.titleThe evolution of nanoscale pores with post-annealing and the structure-electrical property correlation in vanadium oxide thin films
dc.typeArticle

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