Yazar "Bolat, Sami" seçeneğine göre listele

Listeleniyor 1 - 2 / 2
  • [ X ]
    Öğe
    Atomic-layer-deposited zinc oxide as tunable uncooled infrared microbolometer material
    (Wiley-V C H Verlag Gmbh, 2014) Battal, Enes; Bolat, Sami; Tanrikulu, M. Yusuf; Okyay, Ali Kemal; Akin, Tayfun
    ZnO is an attractive material for both electrical and optical applications due to its wide bandgap of 3.37eV and tunable electrical properties. Here, we investigate the application potential of atomic-layer-deposited ZnO in uncooled microbolometers. The temperature coefficient of resistance is observed to be as high as -10.4%K-1 near room temperature with the ZnO thin film grown at 120 degrees C. Spectral noise characteristics of thin films grown at various temperatures are also investigated and show that the 120 degrees C grown ZnO has a corner frequency of 2kHz. With its high TCR value and low electrical noise, atomic-layer-deposited (ALD) ZnO at 120 degrees C is shown to possess a great potential to be used as the active layer of uncooled microbolometers. The optical properties of the ALD-grown ZnO films in the infrared region are demonstrated to be tunable with growth temperature from near transparent to a strong absorber. We also show that ALD-grown ZnO can outperform commercially standard absorber materials and appears promising as a new structural material for microbolometer-based applications.
  • [ X ]
    Öğe
    Digitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applications
    (A V S Amer Inst Physics, 2017) Tilkioglu, Bilge T.; Bolat, Sami; Tanrikulu, Mahmud Yusuf; Okyay, Ali Kemal
    The authors demonstrate the digital alloying of ZnO and TiO2 via atomic layer deposition method to be utilized as the active material of uncooled microbolometers. Depositions are carried out at 200 degrees C. Crystallinity of the material is shown to be degraded with the increase of the Ti content in the grown film. A maximum temperature coefficient of resistance (TCR) of 5.96%/K is obtained with the films containing 12.2 at. % Ti, and the obtained TCR value is shown to be temperature insensitive in the 15-22 degrees C, thereby allowing a wide range of operation temperatures for the low cost microbolometers. (C) 2017 American Vacuum Society.