Alghamdi, HaifaGordo, Vanessa OrsiSchmidbauer, MartinFelix, Jorlandio F.Alhassan, SultanAlhassni, AmraPrando, Gabriela Augusta2025-01-062025-01-0620200021-897910.1063/1.51404472-s2.0-85082590286https://doi.org/10.1063/1.5140447https://hdl.handle.net/20.500.14669/1506The effect of Furnace Annealing (FA) and Rapid Thermal annealing (RTA) on the structural and optical properties of GaAs1 - xBix/GaAs single quantum wells grown on (001) and (311)B substrates by molecular beam epitaxy was investigated. The structural properties were investigated by high-resolution x-ray diffraction (HR-XRD) and Transmission Electron Microscopy. The Bi concentration profiles were determined by simulating the HR-XRD 2?-? scans using dynamical scattering theory to estimate the Bi content, lattice coherence, and quality of the interfaces. The Bi composition was found to be similar for both samples grown on (001) and (311)B GaAs substrates. However, the simulations indicate that the Bi composition is not only limited in the GaAsBi quantum well (QW) layer but also extends out of the GaAsBi QW toward the GaAs barrier. Photoluminescence (PL) measurements were performed as a function of temperature and laser power for samples with a nominal Bi composition of 3%. PL spectra showed that (001) and (311)B samples have different peak energies at 1.23 eV and 1.26 eV, respectively, at 10 K. After RTA at 300 °C for 2 min, the PL intensity of (311)B and (001) samples was enhanced by factors of ?2.5 and 1.75, respectively. However, for the (001) and (311)B FA samples, an enhancement of the PL intensity by a factor of only 1.5 times could be achieved. The enhancement of PL intensity in annealed samples was interpreted in terms of PL activation energies, with a reduction in the alloy disorder and an increase in the Bi cluster. © 2020 Author(s).eninfo:eu-repo/semantics/openAccessActivation energyCoherent scatteringGallium arsenideHigh resolution transmission electron microscopyIII-V semiconductorsLattice theoryMolecular beam epitaxyOptical propertiesQuantum well lasersRapid thermal annealingSemiconducting galliumStructural propertiesX ray diffractionX ray diffraction analysisConcentration profilesDynamical scatteringFurnace annealingHigh-resolution x-ray diffractionPhotoluminescence measurementsRapid thermal annealing (RTA)Single quantum wellStructural and optical propertiesSemiconductor quantum wellsArticle12Q1127